ZEISS Crossbeam
Targeted for the third dimension
The combination of scanning electron microscope (SEM) and focused ion beam (FIB) makes it possible to specifically cut into material on the smallest scale (nanometer range) and directly image the material structure below the surface. Typical applications include precise localization and chemical analysis (EDX) of local defects.
ZEISS Crossbeam for industry
Experience a new quality in the testing of your samples.
Prepare thin lamellae for their analysis in TEM (Transmission electron microscopy) or STEM (Scanning transmission electron microscopy). ZEISS Crossbeam offers a complete solution for preparing TEM lamellae, even in batches.
The low-voltage performance of the ion-sculptor FIB column supports high-quality lamellae and avoids amorphization of delicate specimens. Use a simple workflow to get started and wait for automatic execution. Benefit from endpoint detection software that provides accurate information about the thickness of your lamella.
The optional femtosecond laser is used for material ablation and the improved access to deeper structures as well as for the preparation of large samples.
Fields of application at a glance
- Local cross sections, e.g. at defect sites (growth defects of thin films, corrosion, trapped particles, etc.)
- TEM lamella preparation
- High-resolution cross-section investigations in transmission (STEM)
- 3D tomography of microstructure or local defects
- Processing of structures via targeted material removal