MRE SkillBuilder Series

The ZEISS GeminiSEM 560 is the premier FE-SEM for surface sensitive imaging of “challenging” samples. Its Gemini 3 column enables magnetic field-free imaging below 1kV without any sample biasing, even at the highest resolutions. The end-user benefits from a pronounced ease-of-use in changing and tuning beam conditions and excellent performance, around and well below 1kV. In this workshop, the workflow of imaging various samples notorious for their insulating nature and need for low-kV performance will be covered such as a battery separator, uncoated butterfly wing, positive and negative photoresist, and more. Some background theory and practical steps will be demonstrated on the mentioned samples.
This virtual workshop consists of a single session, streamed live from the ZEISS Microscopy Customer Center (ZMCC) in Dublin, CA. Through screen-sharing from the instrument and multiple cameras, the complete operation of the instrument will be visible as our SEM Application experts cover a full itinerary of training topics as detailed below.
It is recommended that attendees secure time on their instruments after the workshop sessions to apply the shared methods on their own samples. Attendees are strongly encouraged to share their images from individual sessions and interact with our Applications team through independent email threads for further optimization.
 

Who should attend?​

Existing or prospective users of ZEISS SEMs interested in effective approaches for imaging non-conductive and beam sensitive samples, especially at high-resolution

Existing users of ZEISS GeminiSEM 500 or GeminiSEM 560 looking to improve their current skill level to better support and/or train other users​
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Learning Objectives​

• Benefit from a refreshed understanding of how to approach non-conductive and/or beam sensitive samples
• Experience the flexibility in quickly changing beam conditions with little operator intervention
• Gain experience in how to gather high-resolution images on “challenging” samples​

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This is a paid workshop.​
Spots are limited.​

Access to a SEM after each day is strongly recommended to apply lessons learned and share results with applications team for further support.

This virtual workshop consists of a single session, streamed live from the ZEISS Microscopy Customer Center (ZMCC) in Dublin, CA. Through screen-sharing from the instrument and multiple cameras, the complete operation of the instrument will be visible as our SEM Application experts cover a full itinerary of training topics as detailed below.

It is recommended that attendees secure time on their instruments after the workshop sessions to apply the shared methods on their own samples. Attendees are strongly encouraged to share their images from individual sessions and interact with our Applications team through independent email threads for further optimization.