With precision and strong partners

The ZEISS Semiconductor Manufacturing Technology segment is a facilitator for the digital transformation of our every lives. With semiconductor optics, photomask systems and process control solutions. Our lithography optics and other optical systems are part of the key equipment needed for microchip fabrication. The high-precision optics, photomasks and process control solutions make the manufacture of increasingly powerful microchips possible.

ZEISS SMT produces optics for use with DUV (deep ultraviolet) as well as EUV (extreme ultraviolet) light and is already working on the next EUV generation "High-NA-EUV lithography". The numerical aperture will then enable even smaller semiconductor structures measuring under 7 nm. During exposure, the high-precision photomasks from ZEISS SMT transfer the chip structure onto the wafer at a greatly reduced scale. Our correction and measuring systems play an important role in optimizing photomasks. We continue to work on the light of the future.

EUV technology is a joint project

EUV technology is the decisive technological leap for microchips that are even smaller, more powerful and more energy-efficient. This development is possible thanks to around 25 years of research and development by several thousand employees in a European development alliance of around 1,200 partners. On their behalf, the research team from ZEISS, TRUMPF and Fraunhofer was awarded the German Future Prize 2020 for the development of EUV lithography.